Description
Partially closed cells are strategically patterned to drastically improve polishing performance by evenly dispersing compound\/polishing onto the working surface\r\n \t\r\nSlower rate of polish absorption enhances polishing performance\r\n \t\r\nReduced surface tension allows operator to run pad flat on the working surface with greatly minimized pad skipping\r\n \t\r\nCCS pockets gradually release compound\/polish as required, resulting in increased operator control\r\n \t\r\nReduced surface contact generates less friction and heat\r\n \t\r\nCurved edges enable easier polishing in corners and along edges\r\n \t\r\nHook and Loop backing\r\n \t\r\nMachine wash in warm water and air dry to clean\r\n \t\r\nAvailable in Hard\/Cutting, Medium\/Polishing and Soft\/Finessing densities
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